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Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces
Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces
Detailed Information
- 자료유형
- 기사
- ISSN
- 15989623
- 서명/저자
- Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces / C.H.Chang, Y.M.Koo and H.Padmore
- 형태사항
- pp. 23
- 모체레코드
- 모체정보확인
- Control Number
- gtec:385504
MARC
008171220s1996 aa kor■022 ▼a15989623
■245 ▼aTotal Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces▼dC.H.Chang, Y.M.Koo and H.Padmore
■300 ▼app. 23
■7001 ▼aC.H.Chang, Y.M.Koo and H.Padmore
■773 ▼tMetals and Materials International▼gv.2 n.1▼d1996, 02
■SIS ▼aKS009969▼b63240▼h1▼sG
