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Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces
Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Imp...
Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces

Detailed Information

자료유형  
 기사
ISSN  
15989623
서명/저자  
Total Reflection X-ray Fluorescence Spectroscopy Using Synchrotron Radiation for Trace Impurity Analysis of Silicon Wafer Surfaces / C.H.Chang, Y.M.Koo and H.Padmore
형태사항  
pp. 23
기타저자  
C.H.Chang, Y.M.Koo and H.Padmore
기본자료저록  
Metals and Materials International : v.2 n.1 1996, 02
모체레코드  
모체정보확인
Control Number  
gtec:385504

MARC

 008171220s1996                                        aa    kor
■022    ▼a15989623
■245    ▼aTotal  Reflection  X-ray  Fluorescence  Spectroscopy  Using  Synchrotron  Radiation  for  Trace  Impurity  Analysis  of  Silicon  Wafer  Surfaces▼dC.H.Chang,  Y.M.Koo  and  H.Padmore
■300    ▼app.  23
■7001  ▼aC.H.Chang,  Y.M.Koo  and  H.Padmore
■773    ▼tMetals  and  Materials  International▼gv.2  n.1▼d1996,  02
■SIS    ▼aKS009969▼b63240▼h1▼sG

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