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SiCl4-H2 반응가스에 의한 Ni 기판위에서 Si 의 화학증착속도론
SiCl4-H2 반응가스에 의한 Ni 기판위에서 Si 의 화학증착속도론 / 김재수
SiCl4-H2 반응가스에 의한 Ni 기판위에서 Si 의 화학증착속도론

Detailed Information

자료유형  
 기사
ISSN  
17388228
서명/저자  
SiCl4-H2 반응가스에 의한 Ni 기판위에서 Si 의 화학증착속도론 / 김재수
형태사항  
pp. 1655
기타저자  
김재수
기본자료저록  
대한금속ㆍ재료학회지 : v.36 n.10 1998, 10
모체레코드  
모체정보확인
Control Number  
gtec:357377

MARC

 008171026s1998              a    a                          jpn
■022    ▼a17388228
■245    ▼aSiCl4-H2  반응가스에  의한  Ni  기판위에서  Si  의  화학증착속도론▼d김재수
■300    ▼app.  1655
■7001  ▼a김재수
■773    ▼t대한금속ㆍ재료학회지▼gv.36  n.10▼d1998,  10
■SIS    ▼aKS035368▼b63212▼h3▼sG

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