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Oxidation behavior of amorphous boron carbide film deposited using the unbalanced magnetron sputtering method
Oxidation behavior of amorphous boron carbide film deposited using the unbalanced magnetro...
Oxidation behavior of amorphous boron carbide film deposited using the unbalanced magnetron sputtering method

Detailed Information

자료유형  
 기사
ISSN  
17388228
서명/저자  
Oxidation behavior of amorphous boron carbide film deposited using the unbalanced magnetron sputtering method / Kyung Eun Bae
형태사항  
pp. 8
기타저자  
Kyung Eun Bae
기본자료저록  
대한금속ㆍ재료학회지 : v.54 n.1 2016, 01
모체레코드  
모체정보확인
Control Number  
gtec:350908

MARC

 008171019s2016              a    a                          jpn
■022    ▼a17388228
■245    ▼aOxidation  behavior  of  amorphous  boron  carbide  film  deposited  using  the  unbalanced  magnetron  sputtering  method▼dKyung  Eun  Bae  
■300    ▼app.  8
■7001  ▼aKyung  Eun  Bae
■773    ▼t대한금속ㆍ재료학회지▼gv.54  n.1▼d2016,  01
■SIS    ▼aKS031764▼b63212▼h3▼sG

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