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Monitoring Thermal Stress in Wafer-Scale Integrated Circuits by the Attentive Vision Method Using an Infrared Camera
Monitoring Thermal Stress in Wafer-Scale Integrated Circuits by the Attentive Vision Metho...
Monitoring Thermal Stress in Wafer-Scale Integrated Circuits by the Attentive Vision Method Using an Infrared Camera

Detailed Information

자료유형  
 기사
ISSN  
10518215
서명/저자  
Monitoring Thermal Stress in Wafer-Scale Integrated Circuits by the Attentive Vision Method Using an Infrared Camera / Lakhssassi, A. ; Palenychka, R. ; Savaria, Y.
형태사항  
pp. 412
기타저자  
Lakhssassi, A.
기타저자  
Palenychka, R.
기타저자  
Savaria, Y.
기본자료저록  
IEEE transactions on circuits and systems for video technology : v.26 n.2 2016, 02
모체레코드  
모체정보확인
Control Number  
gtec:329335

MARC

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■245    ▼aMonitoring  Thermal  Stress  in  Wafer-Scale  Integrated  Circuits  by  the  Attentive  Vision  Method  Using  an  Infrared  Camera▼dLakhssassi,  A.▼ePalenychka,  R.▼eSavaria,  Y.
■300    ▼app.  412
■7001  ▼aLakhssassi,  A.
■7001  ▼aPalenychka,  R.
■7001  ▼aSavaria,  Y.
■773    ▼tIEEE  transactions  on  circuits  and  systems  for  video  technology▼gv.26  n.2▼d2016,  02
■SIS    ▼aKS032037▼b63262▼h3▼sG

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