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Improved Work Function of Preferentially Oriented Indium Oxide Films Induced by the Plasma Exposure Technique
Improved Work Function of Preferentially Oriented Indium Oxide Films Induced by the Plasma Exposure Technique
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MARC
008151124s2015 a a eng■022 ▼a17388090
■245 ▼aImproved Work Function of Preferentially Oriented Indium Oxide Films Induced by the Plasma Exposure Technique▼dLei Yang▼eShuai Guo, Qiuling Yang
■300 ▼app. 938
■7001 ▼aLei Yang
■7001 ▼aShuai Guo, Qiuling Yang
■773 ▼tElectronic Materials Letters▼gv.11 n.6▼d2015, 11
■SIS ▼aKS031443▼b63247▼h3▼sG
